Chemical vapor deposition (CVD) system

Submitted by Anonymous on Fri, 2018-08-03 18:03

Chemical vapor deposition (CVD) systemCorrigendum : Tender submission and opening date extended to 31.08.2018Corrigendum 2 : Tender has been cancelled as requested by PI 

Reference: 
MET/SMBH/001/2018
File: 
Tender document
CPPP proof
Corrigendum
Corrigendum2
Opening Date: 
03/08/18
Closing Date: 
31/08/18
Address: 
Prof. Somnath Bhattacharyya, Department of Metallurgical and Materials Engineering IIT Madras, Chennai- 600 036
Keywords: 
Chemical Vapor deposition system
Administrative Unit: 
Department of Metallurgical & Materials Engineering